Cryogenic probe station
The Lakeshore EMPX-HF cryogenic probe station is a four-probe system which is capable of reaching temperatures of 3.2K using liquid helium cryogen. It is also equipped with a power supply capable of applying a 0.55T magnetic field at the sample surface.

PECVD reactor
A plasma enhanced chemical vapor deposition (PECVD) reactor is capable of generatingaligned CNT growth due to the presence of an electromagnetic field during the growth phase. The system is equipped with a 3-channel mass flow controller and a heated graphite stage capable of rapid-thermal-processing at temperatures up to 900 °C. Software control allows for completely automated growth processes.

Field emission transmission electron microscope
The FEI Tecnai F-20 200kV field emission high resolution TEM provides a unique combination of outstanding performance, ease-of-use and high-resolution performance in micro-analysis and (S)TEM imaging. It has Schottky type field emission source giving ultra-high brightness and is normally operated at 200 kV. It has point and line resolutions of 0.24 and 0.10 nm, respectively. The equipped EDAX EDS system enables elemental analysis in the nanometer order. The GIF, on the other hand, adds energy-loss spectroscopy and filtered imaging capabilities to this TEM. Attachment of US, MSC, and TV rate CCD cameras enables the digital recording of images. Single-tilt, double-tilt, heated, and cryogenic specimen holders are available for use.

Dual-beam focused ion beam microscope
The FEI Company DB237 is often used to characterize samples with both electron and Ga ion beams. It has the milling and deposition capabilities as well as composition depth profiling and three-dimensional image construction. In addition to the regular function of focused ion beam processing, it also has secondary-ion mass spectroscopy (SIMS) functionality.

Gamry electrochemical probe station

A Gamry Reference 600TM potentiostat/galvanostat/ZRA is for investigating fundamental electrochemical properties with high speed (3000 V/s), wide range (600 mA to 60 pA), current resolution (20 pA) and low noise, for applications in corrosion, coatings, and sensors. The PWR800TM Electrochemical Energy Software is for advanced electrochemical testing in energy research including fuel cells, batteries, solar cells, and supercapacitors. Rotating disk electrode probe is for investigating the kinetic mechanism of electrocatalysts involved in the oxygen reduction reaction for fuel cells.

Field emission scanning electron microscope FEI Sirion FESEM

30kV microscope equipped with Oxford Inca Energy 250 EDX system. The combination of Schottky type field emission source and through-lens detection technology allows ultra-high resolution imaging. The high resolution EDX attachment allows for simultaneous chemical analysis. Complete computer control makes user friendly operation possible.

Chemical vapor deposition reactors
Three CVD reactors are available with a four-channel mass-flow controller and can reach ultimate temperatures of 1200C. They are arranged in a variety of configurations: (1) pressure-regulating butterfly valve, (2) with a 3-mode 4W Q-switched Nd:YAG laser for ablation-based depositions, and (3) with a vapor-phase mass-flow controller.

Field emission scanning electron microscope
FEI Sirion FESEM, 30kV microscope equipped with Oxford Inca Energy 250 EDX system. The combination of Schottky type field emission source and through-lens detection technology allows ultra-high resolution imaging. The high resolution EDX attachment allows for simultaneous chemical analysis. Complete computer control makes user friendly operation possible.

KJ Lesker PVD
The KJLC AXXIS system provides three mechanisms for film deposition: thermal evaporation, electron-beam induced deposition, and DC & RF magnetron sputtering enabling the deposition of insulating and magnetic as well as conductive materials.

Magnetron sputter coater
A desktop magnetron sputtering system capable of depositing magnetic and non-magnetic metals, and dielectrics.

JEOL transmission electron microscope
The JEOL 2000FX TEM can operate up to 200kV with approximately 0.35nm point resolution, it uses a LaB6 emitter, is equipped with an EDS detector, and is capable of operating in STEM mode.

Micro-environmental probe station
A custom designed electrical probe station capable of ultra high vacuum (1x10-9 torr) base pressure, sample heating up to 500C, and precision leak gas (O2, CO2, H2O, etc.) control. Gas concentrations can be monitored using a 4-channel residual gas analyzer. The system is equipped with modular electric and fiber optic probes capable of a variety of measurements (using an Agilent B1500A semiconductor analyzer) including IV characterization, four-point probe resistance, field emission, and photo-stimulation using a tunable Ti:sapphire laser (700-950 nm).

Cascade probe station
An Agilent 4156C semiconductor parameter analyzer and  low-noise micro-chamber probe station allow pA-level current measurements. This system can perform a variety of electrical measurements: four-point probe, conductivity, IV characteristics, etc.

Horiba Raman/PL system
The HR800 UV is equipped with a 100 mW 532 nm diode-pumped solid-state laser and a 15 mW 325nm HeCd laser. Raman spectroscopy and photolumniescence properties can be measured with either laser and a piezoelectric stage allows mapping with <100nm step size.

Solar cell test bench
The system includes a Keithley 2400 digital source meter and a 150 W Newport solar simulator for measuring various properties (open circuit voltage, current output, etc) of a wide range of photovoltaic devices.

Variable pressure SEM
The Zeiss Sigma VP FEG is a variable pressure field emission SEM equipped with Oxford EDS/WDS detectors and E-beam lithography system. 1.3-nm imaging resolution is achievable at 20kV. The microscope is ideal for organic and inorganic materials, geology, biological samples with a capability of elemental composition analysis and comprehensive pattern generation

UV-vis spectrophotometer
The UV-3600 allows for spectral, photometry, or kinetic measurements of reflection, absorption, and transmission for bulk, thin-film, or liquid-suspended materials for wavelength between 3300-190 nm (0.376-6.52 eV).

Desktop SEM
The Phenom Desktop SEM is a high-resolution desktop imaging tool, bridging the gap between optical and electrical technologies. This machine is capable of imaging a sample to 20,000x magnification using a 5kV electron beam in less than 30 seconds. Its low vacuum design makes is applicable for a variety of samples.

Sample prep room
This room is equipped for SEM and TEM specimen preparation with the following: plasma cleaner, precision ion polishing system, precision polishing machine, ultrasonic disc cutter, disc punch, dimple grinder, disc grinder, specimen mounting hot plate, diamond saw, sputter and carbon coaters, critical point drying system, and optical microscope.